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Electrodeposition growth of multiphase metal telluride thin films: Structural, optical, electrical properties, and DFT calculations

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dc.contributor.author Panupat Chaiworn
dc.contributor.author Pensri Pramukkul
dc.contributor.author Prayoonsak Pluengphon
dc.contributor.author Ekasiddh Wongrat
dc.contributor.author Phathaitep Raksa
dc.contributor.author Piyanooch Nedkun
dc.contributor.author Auttasit Tubtimtae
dc.contributor.author ภาณุพัฒน์ ชัยวร
dc.contributor.author เพ็ญศรี ประมุขกุล
dc.contributor.author ประยูรศักดิ์ เปลื้องผล
dc.contributor.author เอกสิทธิ์ วงศ์ราษฎร์
dc.contributor.author ผไทเทพ รักษา
dc.contributor.author ปิยนุช เนตรคุณ
dc.contributor.author อัฐสิษฐ์ ทับทิมแท้
dc.contributor.other Chiang Mai Rajabhat University. Department of Physics and General Science en_US
dc.contributor.other Chiang Mai Rajabhat University. Department of Physics and General Science en_US
dc.contributor.other Huachiew Chalermprakiet University. Faculty of Science and Technology en_US
dc.contributor.other University of Phayao. School of Science en_US
dc.contributor.other Rajamangala University of Technology Isan. Faculty of Science and Liberal Arts en_US
dc.contributor.other Kasetsart University Chalermphrakiet Sakon Nakhon Province Campus. Faculty of Science and Engineering en_US
dc.contributor.other Kasetsart University Kamphaeng Saen Campus. Faculty of Liberal Arts and Science en_US
dc.date.accessioned 2026-07-18T13:35:15Z
dc.date.available 2026-07-18T13:35:15Z
dc.date.issued 2026
dc.identifier.citation Materials Chemistry and Physics 362,15 August 2026, 132752 en_US
dc.identifier.other https://doi.org/10.1016/j.matchemphys.2026.132752
dc.identifier.uri https://has.hcu.ac.th/xmlui/handle/123456789/5851
dc.description สามารถเข้าถึงบทความฉบับเต็ม (Full Text) ได้ที่ : https://www.sciencedirect.com/science/article/abs/pii/S0254058426007455 en_US
dc.description.abstract This study investigated the effects of applied electrodeposition potentials on the structural, optical, and electrical properties of multiphase metal telluride thin films for optoelectronic applications. The rhombohedral Sb2Te3, Bi2Te3, Al7Te10, and Bi4Te3 phases were identified and incorporated into thin films containing hexagonal Bi2Te, BiTe, and monoclinic Al2Te3. Variations in the crystallographic parameters are attributed to recrystallization and phase transformation processes driven by the energy stored in the parent Bi2Te3 phase. Scanning electron microscopy (SEM) images showed a compact inner surface covered with residuals dispersed across the film surface at the applied potentials of 4 and 6 V. At an applied potential of 8 V, crack formation accompanied by a reduction in surface residuals was observed, whereas films deposited at 10 V exhibited more pronounced cracking with no noticeable residuals. Energy-dispersive X-ray spectroscopy (EDS) confirmed the presence of Al, Sb, Te, and Bi in all the deposited films, indicating the successful incorporation of binary multiphase metal chalcogenide compounds. The band gaps of the deposited films are decreased with increasing electrodeposition potential, highlighting the tunability of the electronic properties of multiphase metal telluride thin films. A significant decline in the activation energy (Eac) was observed between 6 and 8 V, suggesting that this range is the optimal applied voltage window for device applications due to enhanced thermally activated conduction. Finally, density functional theory (DFT) calculations of the photo absorption coefficient indicated that Bi2Te3 and Sb2Te3 exhibited higher absorption coefficients than Al2Te3 and Al7Te10. Among these materials, Bi2Te3 exhibited the strongest absorption coefficient at higher photon energies, whereas the other phases exhibited enhanced absorption in the red-light region. en_US
dc.language.iso en_US en_US
dc.subject Electrodeposition en_US
dc.subject การชุบโลหะด้วยไฟฟ้า en_US
dc.subject Electroplating en_US
dc.subject การชุบเคลือบผิวด้วยไฟฟ้า en_US
dc.subject Photo absorption coefficient en_US
dc.subject สัมประสิทธิ์การดูดกลืนแสง en_US
dc.subject Metal telluride thin films en_US
dc.subject ฟิล์มบางโลหะเทลลูไรด์ en_US
dc.subject Thin films en_US
dc.subject ฟิล์มบาง en_US
dc.subject Semiconductor en_US
dc.subject การเติมสารกึ่งตัวนำ en_US
dc.subject Dopping en_US
dc.subject พลวง en_US
dc.subject Antimony en_US
dc.subject อะลูมิเนียม en_US
dc.subject Aluminum en_US
dc.subject อะลูมินัม en_US
dc.subject วิทยาศาสตร์และเทคโนโลยี en_US
dc.title Electrodeposition growth of multiphase metal telluride thin films: Structural, optical, electrical properties, and DFT calculations en_US
dc.type Article en_US


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